[2015 KCS] Extraction of Distance between Interface Trap and Oxide Trap from Random Telegraph Noise in Gate-Induced Drain Leakage

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[2015 KCS] Extraction of Distance between Interface Trap and Oxide Trap from Random Telegraph Noise in Gate-Induced Drain Leakage

기간

2015

참가자

Youngsoo Seo, Sungwon Yoo, Hyunsoo Kim, Hyunsuk Kim and Hyungcheol Shin

대회명

Korean Conference on Semiconductors

Youngsoo Seo, Sungwon Yoo, Hyunsoo Kim, Hyunsuk Kim and Hyungcheol Shin, “Extraction of Distance between Interface Trap and Oxide Trap from Random Telegraph Noise in Gate-Induced Drain Leakage”, Korean Conference on Semiconductors(KCS), 2015.

[2015 KCS] Extraction of Distance between Interface Trap and Oxide Trap from Random Telegraph Noise in Gate-Induced Drain Leakage

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