바로가기 메뉴
본문 바로가기
푸터 바로가기
TOP

 

[2017 ICSPD] Intrinsic Characteristics and Process Variation Effect of Nanoplate Vertical FET Device

기간

참가자

대회명

Minsoo Kim, Kyul Ko, Changbeom Woo, Myounggon Kang and Hyungcheol Shin, “Intrinsic Characteristics and Process Variation Effect of Nanoplate Vertical FET Devices”, International Conference on Semiconductor Physics and Device (ICSPD), 2017.