Home · [2017 ICSPD] Intrinsic Characteristics and Process Variation Effect of Nanoplate Vertical FET Device
Home · [2017 ICSPD] Intrinsic Characteristics and Process Variation Effect of Nanoplate Vertical FET Device
[2017 ICSPD] Intrinsic Characteristics and Process Variation Effect of Nanoplate Vertical FET Device
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Minsoo Kim, Kyul Ko, Changbeom Woo, Myounggon Kang and Hyungcheol Shin, “Intrinsic Characteristics and Process Variation Effect of Nanoplate Vertical FET Devices”, International Conference on Semiconductor Physics and Device (ICSPD), 2017.