Investigation of Gate Etch Damage at Metal/High-k Gate Dielectric Stack Through Random Telegraph Noise in Gate Edge Direct Tunneling Current

Home · Investigation of Gate Etch Damage at Metal/High-k Gate Dielectric Stack Through Random Telegraph Noise in Gate Edge Direct Tunneling Current

저자

Heung-Jae Cho, Younghwan Son, Byoungchan Oh, Seunghyun Jang, Jong-Ho Lee, Byung-Gook Park, and Hyungcheol Shin

저널 정보

IEEE Electron Device Letters (EDL)

출간연도

2011

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