Abstract: 

In order to implement complementary logic function with L-shaped tunneling field-effect transistors (TFETs), current drivability and subthreshold swing (SS) need to be improved more. For this purpose, highk material such as hafnium dioxide (HfO2) has been used as gate dielectric rather than silicon dioxide (SiO2). The effects of device parameters on performance have been investigated and the design of L-shaped TFETs has been optimized. Finally, the performance of L-shaped TFET inverters have been compared with that of conventional TFET ones.