Patterning of Si nanowire array with electron beam lithography for sub-22 nm Si nanoelectronics technology

Home · Patterning of Si nanowire array with electron beam lithography for sub-22 nm Si nanoelectronics technology

저자

Min-Chul Sun, Garam Kim, Jung Han Lee, Hyungjin Kim, Sang Wan Kim, Hyun Woo Kim, Jong-Ho Lee, Hyungcheol Shin, and Byung-Gook Park

저널 정보

Microelectronic Engineering

출간연도

2013

링크